Program
Program
Plenary Speakers
Invited Speakers
Tutorial Sessions
ISPB 2018
Floor Plan
Date
Select
July 25 (Wed.)
July 26 (Thu.)
July 27 (Fri.)
July 28 (Sat.)
Place
ALL PLACE
Room A (#104~106)
Room B (#113)
Room C (#114)
Room D (#115)
Room E (#107~108)
Room F (#117~118)
Room Room D (#115)
FD3. Plasma Assisted Process Monitoring Technologies
July 27 (Fri.)
14:30-17:00 ~
[FD3-1]
14:30-15:00 ~
Room D (#115)
[Invited] Cutoff Probe for Process Monitoring
ShinJae You (Chungnam Nat`l Univ., Korea)
[FD3-2]
15:00-15:20 ~
Room D (#115)
Study of Plasma Diagnostics and Algorithm for Virtual Metrology in Etch Process Plasma
Jongsik Kim, Dae Chul Kim, Jung Ho Song, Yonghyun Kim, Young-Woo Kim, Duksun Han, Mi-Young Song, and Jung-Sik Yoon (NFRI, Korea)
[FD3-3]
15:20-15:40 ~
Room D (#115)
Development of Plasma Information Based Virtual Metrology to Trace the Drift of Plasma-Assisted Processes
Hyun-Joon Roh
1
, Sangwon Ryu
1
, Yunchang Jang
1
, Nam-Kyun Kim
1
, Younggil Jin
2
, Seolhye Park
2
, and Gon-Ho Kim1 (
1
Seoul Nat`l Univ., Korea,
2
Samsung Display Co., Ltd., Korea)
[FD3-4]
15:40-16:00 ~
Room D (#115)
Measurement of Electron Density of the Cutoff Probe in High Pressure Plasma
SiJun Kim
1
, JangJae Lee
1
, YoungSeok Lee
1
, ChulHee Cho
1
, SeungWan Yoo
1
, JungHyung Kim
2
, and ShinJae You1 (
1
Chungnam Nat`l Univ., Korea,
2
KRISS, Korea)
[FD3-5]
16:00-16:20 ~
Room D (#115)
Performance Evaluation Method of RF Generators with In-Situ Plasma Process Monitoring Sensors
Kyung Jae Jo, Syed Ashar Ali, and Sang Jeen Hong (Myongji Univ., Korea)
[FD3-6]
16:20-16:40 ~
Room D (#115)
A Linear Combination Model for Analyzing Long-Time Data Trend in a Plasma Etching Process
Moojin Kim, Gunpil Hwang, Seungjin Kim, and Yongjoon Cheong (Samsung Electronics Co., Ltd., Korea)
[FD3-7]
16:40-17:00 ~
Room D (#115)
Surrogate Modeling of Plasma System with Bayesian Deep Neural Network
Damdae Park and Jong Min Lee (Seoul Nat`l Univ., Korea)
Type
Authors
Session Title
Paper Title
