Date
Place
- Room D (#115)
- FD3. Plasma Assisted Process Monitoring Technologies
- July 27 (Fri.)
- 14:30-17:00 ~
- [FD3-4]
- 15:40-16:00 ~
- Title:Measurement of Electron Density of the Cutoff Probe in High Pressure Plasma
- SiJun Kim1, JangJae Lee1, YoungSeok Lee1, ChulHee Cho1, SeungWan Yoo1, JungHyung Kim2, and ShinJae You1 (1Chungnam Nat`l Univ., Korea, 2KRISS, Korea)
Abstract Download
