Date
Place
- Room D (#115)
- FD3. Plasma Assisted Process Monitoring Technologies
- July 27 (Fri.)
- 14:30-17:00 ~
- [FD3-2]
- 15:00-15:20 ~
- Title:Study of Plasma Diagnostics and Algorithm for Virtual Metrology in Etch Process Plasma
- Jongsik Kim, Dae Chul Kim, Jung Ho Song, Yonghyun Kim, Young-Woo Kim, Duksun Han, Mi-Young Song, and Jung-Sik Yoon (NFRI, Korea)
Abstract Download
