ICMAP 2018

Program

Program
Plenary Speakers
Invited Speakers
Tutorial Sessions
ISPB 2018
Floor Plan

Date

Place

Room A (#104~106)
WA1. Contamination Control in Semiconductor / Display Technologies
July 25 (Wed.)
09:00-10:00,13:00-13:40 ~
Taesung Kim (Sungkyunkwan Univ., Korea)

Room A (#104~106)
WA2. Plasmas for Environmental Technology
July 25 (Wed.)
13:40-15:10 ~
Heeyeop Chae (Sungkyunkwan Univ., Korea)

Room A (#104~106)
WA3. Sensors for Wearable Electronics
July 25 (Wed.)
15:30-17:40 ~
Hyoun Woo Kim (Hanyang Univ., Korea)
Hyunhyub Ko (UNIST, Korea)

Room B (#113)
WB1. Plasma Medicine for Skin Applications
July 25 (Wed.)
09:00-10:30 ~
Klaus Dieter Weltmann (INP Greifswald, Germany)
Sun Jung Kim (Dongguk Univ., Korea)

Room B (#113)
WB2. Plasma Medicine for Skin Applications
July 25 (Wed.)
13:20-15:00 ~
Sybille Hasse (INP Greifswald, Germany)
Ku Youn Baik (Kwangwoon Univ., Korea)

Room B (#113)
WB3. Plasma Medicine for Skin Applications
July 25 (Wed.)
15:30-17:40 ~
Thomas von Woedtke (INP Greifswald, Germany)
Nagendra Kaushik (Kwangwoon Univ., Korea)

Room C (#114)
WC1. Plasma and Liquid
July 25 (Wed.)
09:00-10:20 ~
Takao Namihira (Kumamoto Univ., Japan)

Room C (#114)
WC2. Plasma and Liquid
July 25 (Wed.)
13:20-14:40 ~
Nozomi Takeuchi (AIST, Japan)

Room C (#114)
WC3. Plasma and Liquid
July 25 (Wed.)
15:30-17:40 ~
Naoki Shirai (Hokkaido Univ., Japan)

Room D (#115)
WD1. Modeling and Simulation of Plasma-Surface Interaction
July 25 (Wed.)
09:00-10:30 ~
Hae June Lee (Pusan Nat`l Univ., Korea)
Yuan-Hong Song (Dalian Univ. of Tech., China)

Room D (#115)
WD2. Modeling and Simulation of CCP and ICP
July 25 (Wed.)
13:20-14:50 ~
Kosuke Yamamoto (Tokyo Electron Tech., Japan)
Julian Schulze (Ruhr Univ. of Bochum, Germany)

Room D (#115)
WD3. Atmospheric Pressure Discharges and Thermal Plasmas
July 25 (Wed.)
15:30-17:30 ~
Jong-Shinn Wu (Nat`l Chao Tung Univ., Taiwan)
Ho Jun Kim (Dong-A Univ., Korea)

Room E (#107~108)
WE1. Nano Devices Using 2D Materials
July 25 (Wed.)
09:00-10:30 ~
Myung-Ho Bae (KRISS, Korea)

Room E (#107~108)
WE2. Nano Devices Using 2D Materials
July 25 (Wed.)
13:20-15:00 ~
Won Jong Yoo (Sungkyunkwan Univ., Korea)

Room E (#107~108)
WE3. Nano Devices Using 2D Materials
July 25 (Wed.)
15:30-17:00 ~
Haeseong Lee (Jeonju Univ., Korea)

Room E (#107~108)
WE4. Nano Devices Using 2D Materials
July 25 (Wed.)
17:00-18:30 ~
Young Chul Choi (KCTECH, Korea)

Room F (#117~118)
WP. Poster Session
July 25 (Wed.)
17:30-19:00 ~

Room A (#104~106)
TA1. Sputtering Technologies
July 26 (Thu.)
09:00-10:30 ~
Junghoon Joo (Kunsan Nat`l Univ., Korea)

Room A (#104~106)
TA2. Plasma Farming
July 26 (Thu.)
13:20-15:10 ~
Cheorun Jo (Seoul Nat`l Univ., Korea)

Room A (#104~106)
TA3. Plasma Farming
July 26 (Thu.)
15:30-17:10 ~
Gyungsoon Park (Kwangwoon Univ., Korea)

Room B (#113)
TB1. Plasma Medicine for Skin Applications
July 26 (Thu.)
09:00-10:30 ~
Kai Masur (INP Greifswald, Germany)
Jun-Seok Oh (Osaka City Univ., Japan)

Room B (#113)
TB2. Plasma Medicine for Cancer Applications
July 26 (Thu.)
13:20-14:50 ~
Hans-Robert Metelmann (Greifswald Univ. Medicine, Germany)
Alexander Fridman (Drexel Univ., USA)

Room B (#113)
TB3. Plasma Characterization
July 26 (Thu.)
15:30-17:00 ~
Jean-Michel Pouvesle (GREMI, CNRS/Univ. of Orleans, France)
Manish Adhikari (Kwangwoon Univ., Korea)

Room C (#114)
TC1. Plasma and Liquid
July 26 (Thu.)
09:00-10:00 ~
Sungmo Moon (KIMS, Korea)

Room C (#114)
TC2. Next Generation Plasma Etching
July 26 (Thu.)
13:20-15:00 ~
Thorsten Lill (Lam Research Corp., USA)
Alok Ranjan (Tokyo Electron, USA)

Room C (#114)
TC3. Next Generation Plasma Etching
July 26 (Thu.)
15:30-17:00 ~
Nam Hun Kim (Adaptive Plasma Tech. Corp., Korea)
Jason Kenney (Applied Materials, Inc., USA)

Room D (#115)
TD1. Plasma Sources and Technologies
July 26 (Thu.)
09:00-10:40 ~
Heesoo Jung (ADD, Korea)

Room D (#115)
TD2. Plasma Sources and Technologies
July 26 (Thu.)
13:20-15:10 ~
Junghoon Joo (Kunsan Nat`l Univ., Korea)

Room D (#115)
TD3. Plasma Sources and Technologies
July 26 (Thu.)
15:30-17:40 ~
Hae June Lee (Pusan Nat`l Univ., Korea)

Room E (#107~108)
TE1. Plasma for Nanomaterial Processing
July 26 (Thu.)
13:20-15:00 ~
Toshiaki Kato (Tohoku Univ., Japan)

Room E (#107~108)
TE2. Plasma for Nanomaterial Processing
July 26 (Thu.)
15:30-17:20 ~
Hyung-Mo Jeong (Kangwon Nat`l Univ., Korea)

Room F (#117~118)
TP. Poster Session
July 26 (Thu.)
17:30-19:00 ~

Room A (#104~106)
FA1. Sputtering / Ion Beam Applications
July 27 (Fri.)
09:00-10:20 ~
Andreas Pflug (Fraunhofer Inst. for Surface Engineering and Thin Films IST, Germany)
Jun Xu (Dalian Univ. of Technology, China)

Room A (#104~106)
FA2. Plasma Farming
July 27 (Fri.)
13:20-15:00 ~
Wonho Choe (KAIST, Korea)

Room A (#104~106)
FA3. Plasma Farming
July 27 (Fri.)
15:30-17:00 ~
Jaesung Oh (NFRI, Korea)

Room B (#113)
FB1. Plasma Characterization
July 27 (Fri.)
09:00-10:40 ~
Eun Ha Choi (Kwangwoon Univ., Korea)
Vittorio Colombo (Univ. of Bologna, Italy)

Room B (#113)
FB2. Plasma Biomaterial
July 27 (Fri.)
13:20-15:10 ~
Satoshi Hamaguchi (Osaka Univ., Japan)
Ihn Han (Kwangwoon Univ., Korea)

Room B (#113)
FB3. Plasma Characterization III
July 27 (Fri.)
15:30-17:00 ~
XinPei Lu (HuaZhong Univ. of Science and Tech., China)
David Graves (Univ. of California, USA)

Room C (#114)
FC1. Plasma & Atomic Layer Etching
July 27 (Fri.)
09:10-10:40 ~
Eric A Joseph (IBM T. J. Watson Research Center, USA)
Fred Roozeboom (Eindhoven Univ. of Tech., Netherlands)

Room C (#114)
FC2. Plasma & Atomic Layer Etching
July 27 (Fri.)
13:40-15:00 ~
Nam Hun Kim (Adaptive Plasma Tech. Corp., Korea)
Thorsten Lill (Lam Research Corp., USA)

Room C (#114)
FC3. Plasma and Liquid
July 27 (Fri.)
15:30-17:20 ~
Li Oi Lun (Pusan Nat`l Univ., Korea)

Room D (#115)
FD1. Fundamental Processes in Plasma
July 27 (Fri.)
09:00-10:40 ~
Mi-Young Song (NFRI, Korea)

Room D (#115)
FD2. Fundamental Processes in Plasma
July 27 (Fri.)
13:20-14:10 ~
Mi-Young Song (NFRI, Korea)

Room D (#115)
FD3. Plasma Assisted Process Monitoring Technologies
July 27 (Fri.)
14:30-17:00 ~
Jung-Sik Yoon (NFRI, Korea)

Room E (#107~108)
FE1. Energy and Related Devices
July 27 (Fri.)
09:00-11:00 ~
Myunghun Shin (Korea Aerospace Univ., Korea)
Doo-Hyun Ko (Kyung Hee Univ., Korea)

Room E (#107~108)
FE2. Flexible / Stretchable Display Technology
July 27 (Fri.)
13:20-15:10 ~
Chi Hwan Lee (Purdue Univ., USA)

Room E (#107~108)
FE3. Flexible / Stretchable Display Technology
July 27 (Fri.)
15:30-17:10 ~
Jong-Hyun Ahn (Yonsei Univ., Korea)

Room F (#117~118)
FP. Poster Session
July 27 (Fri.)
17:30-19:00 ~

Room B (#113)
SB1. Plasma Biomaterial
July 28 (Sat.)
09:00-10:40 ~
Pankaj Attri (Univ. of Antwerp, Belgium)
Takayuki Ohta (Meijo Univ., Japan)

Room B (#113)
SB2. Plasma Applications
July 28 (Sat.)
10:50-12:30 ~
Jae-Sung Kwon (Yonsei Univ., Korea)
Lenka Zajickova (Masaryk Univ., Czech)

Room C (#114)
SC1. Plasma ALD / PECVD
July 28 (Sat.)
09:00-10:40 ~
Han-Bo-Ram Lee (Incheon Nat`l Univ., Korea)

Room C (#114)
SC2. Plasma ALD / PECVD
July 28 (Sat.)
10:50-12:30 ~
Han-Bo-Ram Lee (Incheon Nat`l Univ., Korea)

Room D (#115)
SD1. Plasma Sources and Technologies
July 28 (Sat.)
09:00-10:40 ~
Shin Jae?You (Chungnam Univ., Korea)

Room D (#115)
SD2. Plasma Sources and Technologies
July 28 (Sat.)
10:50-12:30 ~
Hyo-Chang Lee (KRISS, Korea)

Type

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