Date
Place
- Room D (#115)
- FD3. Plasma Assisted Process Monitoring Technologies
- July 27 (Fri.)
- 14:30-17:00 ~
- [FD3-6]
- 16:20-16:40 ~
- Title:A Linear Combination Model for Analyzing Long-Time Data Trend in a Plasma Etching Process
- Moojin Kim, Gunpil Hwang, Seungjin Kim, and Yongjoon Cheong (Samsung Electronics Co., Ltd., Korea)
Abstract Download
