Program
Program
Plenary Speakers
Invited Speakers
Tutorial Sessions
ISPB 2018
Floor Plan
Date
Select
July 25 (Wed.)
July 26 (Thu.)
July 27 (Fri.)
July 28 (Sat.)
Place
ALL PLACE
Room A (#104~106)
Room B (#113)
Room C (#114)
Room D (#115)
Room E (#107~108)
Room F (#117~118)
Room Room A (#104~106)
WA1. Contamination Control in Semiconductor / Display Technologies
July 25 (Wed.)
09:00-10:00,13:00-13:40 ~
[WA1-1]
09:00-09:30 ~
Room A (#104~106)
[Invited] Challenges of Particle Control Technology in the Semiconductor and Display Process Equipments
Seungki Chae (Sungkyunkwan Univ., Korea)
[WA1-2]
09:30-10:00 ~
Room A (#104~106)
[Invited] Towards Automation of Quantitative Analysis of Various Digital Images for Material and Process Characterization
Woo Sik Yoo (WaferMasters, Inc., USA)
[WA1-3]
13:00-13:20 ~
Room A (#104~106)
Characterization of Atmospheric Electrodeless Microwave Plasma in Nitrogen
Hojoong Sun, Jungwun Lee, and Moon Soo Bak (Sungkyunkwan Univ., Korea)
[WA1-4]
13:20-13:40 ~
Room A (#104~106)
Mechanism Analysis of NH3/NF3 Remote Plasma Dry Cleaning Reactions Using TOF-MASS
Jiheon Kim
1
, Shin Kim
1
, Kyoungwoo Kwon
1
, Byeonghwa Jeong
1
, Kiyoung Yun
1
, Seoungki Chae
2
, and Kyunghwan Jeong2 (
1
ULVAC KOREA, Co., Ltd., Korea,
2
Sungkyunkwan Univ., Korea)
Type
Authors
Session Title
Paper Title
