Date
Place
- Room A (#104~106)
- WA1. Contamination Control in Semiconductor / Display Technologies
- July 25 (Wed.)
- 09:00-10:00,13:00-13:40 ~
- [WA1-4]
- 13:20-13:40 ~
- Title:Mechanism Analysis of NH3/NF3 Remote Plasma Dry Cleaning Reactions Using TOF-MASS
- Jiheon Kim1, Shin Kim1, Kyoungwoo Kwon1, Byeonghwa Jeong1, Kiyoung Yun1, Seoungki Chae2, and Kyunghwan Jeong2 (1ULVAC KOREA, Co., Ltd., Korea, 2Sungkyunkwan Univ., Korea)
Abstract Download
