Program
Program
Plenary Speakers
Invited Speakers
Tutorial Sessions
ISPB 2018
Floor Plan
Date
Select
July 25 (Wed.)
July 26 (Thu.)
July 27 (Fri.)
July 28 (Sat.)
Place
ALL PLACE
Room A (#104~106)
Room B (#113)
Room C (#114)
Room D (#115)
Room E (#107~108)
Room F (#117~118)
Room Room A (#104~106)
FA1. Sputtering / Ion Beam Applications
July 27 (Fri.)
09:00-10:20 ~
[FA1-1]
09:00-09:20 ~
Room A (#104~106)
Effect of Deposition Temperature on the Ferroelectric Properties of Y-Doped HfO2 Thin Film Prepared by Medium-Frequency Reactive Magnetron Co-Sputtering
Yu Zhang
1
, Jun Xu
1
, Da-yu Zhou
1
, Hang-hang Wang
1
, Wen-qi Lu
1
, Chi-Kyu Choi
2
, Jeong-Yong Lee
3
, and Sung-Kyu Kim3 (
1
Dalian Univ. of Tech., China,
2
Jeju Nat`l Univ., Korea,
3
KAIST, Korea)
[FA1-2]
09:20-09:40 ~
Room A (#104~106)
EXAFS Study of Zinc Ferrite Thin Film on Glass Substrate
Jitendra Pal Singh and Keun Hwa Chae (KIST, Korea)
[FA1-3]
09:40-10:00 ~
Room A (#104~106)
Magnetron Sputtering System Design for TSV(through silicon via) Applications
Junghoon Joo (Kunsan Nat`l Univ., Korea)
[FA1-4]
10:00-10:20 ~
Room A (#104~106)
Damage Control for Transistor Junction Engineering by Using Aromatic Hydrocarbon Ion Implantation
Kyungwon Lee
1
, DaeHo Yoon
1
, Dwight Roh
2
, Michael Ameen
2
, Ronald Reece
2
, and Rimpyo Hong2 (
1
Sungkyunkwan Univ., Korea,
2
Axcelis Technologies, Inc., USA)
Type
Authors
Session Title
Paper Title
