Date
Place
- Room A (#104~106)
- FA1. Sputtering / Ion Beam Applications
- July 27 (Fri.)
- 09:00-10:20 ~
- [FA1-1]
- 09:00-09:20 ~
- Title:Effect of Deposition Temperature on the Ferroelectric Properties of Y-Doped HfO2 Thin Film Prepared by Medium-Frequency Reactive Magnetron Co-Sputtering
- Yu Zhang1, Jun Xu1, Da-yu Zhou1, Hang-hang Wang1, Wen-qi Lu1, Chi-Kyu Choi2, Jeong-Yong Lee3, and Sung-Kyu Kim3 (1Dalian Univ. of Tech., China, 2Jeju Nat`l Univ., Korea, 3KAIST, Korea)
Abstract Download
