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Program

Date
Place
  • Room A (#104~106)
  • FA1. Sputtering / Ion Beam Applications
  • July 27 (Fri.)
  • 09:00-10:20 ~
  • [FA1-4]
  • 10:00-10:20 ~
  • Title:Damage Control for Transistor Junction Engineering by Using Aromatic Hydrocarbon Ion Implantation
  • Kyungwon Lee1, DaeHo Yoon1, Dwight Roh2, Michael Ameen2, Ronald Reece2, and Rimpyo Hong2 (1Sungkyunkwan Univ., Korea, 2Axcelis Technologies, Inc., USA)

  • Abstract Download