Program
Program
Plenary Speakers
Invited Speakers
Tutorial Sessions
ISPB 2018
Floor Plan
Date
Select
July 25 (Wed.)
July 26 (Thu.)
July 27 (Fri.)
July 28 (Sat.)
Place
ALL PLACE
Room A (#104~106)
Room B (#113)
Room C (#114)
Room D (#115)
Room E (#107~108)
Room F (#117~118)
Room Room A (#104~106)
WA2. Plasmas for Environmental Technology
July 25 (Wed.)
13:40-15:10 ~
[WA2-1]
13:40-14:10 ~
Room A (#104~106)
[Invited] Nonthermal Plasma Enabled Electrification of Energy and Materials Conversion Processes
Tomohiro Nozaki, Seigo Kameshima, and Zunrong Sheng (Tokyo Inst. of Tech., Japan)
[WA2-2]
14:10-14:30 ~
Room A (#104~106)
Plasma Etching of SiO2 Perfluorinated and Partially Fluorinated Fluoro Ethers
Jun-Hyun Kim, Jin-Su Park, and Chang-Koo Kim (Ajou Univ., Korea)
[WA2-3]
14:30-14:50 ~
Room A (#104~106)
Realistic Surface Reaction Modeling of Fluorocarbon Plasma Etch Process
Hae Sung You, Yeong Geun Yook, Jae Hyeong Park, and Yeon Ho Im (Chonbuk Nat`l Univ., Korea)
[WA2-4]
14:50-15:10 ~
Room A (#104~106)
Ethylene Treatment Using Nanosecond Pulsed Streamer Discharge
Asuki Iwasaki, Yasuaki Torigoe, Douyan Wang, and Takao Namihira (Kumamoto Univ., Japan)
Type
Authors
Session Title
Paper Title
