Date
Place
- Room F (#117~118)
- WP. Poster Session
- July 25 (Wed.)
- 17:30-19:00 ~
- [WP-056]
- 17:30-19:00 ~
- Title:Semiconductor Surface Changes after NF3/H2O Plasma Cleaning Processing
- Seran Park1, Hoonjung Oh2, Gyoodong Kim3, and Dae-Hong Ko1 (1Yonsei Univ., Korea, 2BIT Micro Fab Research Center, Korea, 3Advanced Cleaning Network, Korea)
Abstract Download
