Date
Place
- Room F (#117~118)
- WP. Poster Session
- July 25 (Wed.)
- 17:30-19:00 ~
- [WP-045]
- 17:30-19:00 ~
- Title:A Study on the Etching Residues of Silicon Dioxide Sidewalls after Contact-Hole Etching in C4F8+CH2F2+O2+Ar Plasma
- Changmok Kim, Jaemin Lee, Junmyung Lee, Jihun Kim, and Kwang-Ho Kwon (Korea Univ., Korea)
Abstract Download
