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Program

Date
Place
  • Room F (#117~118)
  • WP. Poster Session
  • July 25 (Wed.)
  • 17:30-19:00 ~
  • [WP-040]
  • 17:30-19:00 ~
  • Title:Angular Dependence of SiO2 Etch Rates in Hexafluoroisopropanol Plasmas
  • Jin-Su Park, Jun-Hyun Kim, and Chang-Koo Kim (Ajou Univ., Korea)

  • Abstract Download