Date
Place
- Room D (#115)
- WD1. Modeling and Simulation of Plasma-Surface Interaction
- July 25 (Wed.)
- 09:00-10:30 ~
- [WD1-2]
- 09:30-10:00 ~
- Title:[Invited] Modeling of Plasma-Enhanced ALD for Silicon Oxide Films as Clarification of Fundamental Deposition Mechanism
- Kosuke Yamamoto, Ayuta Suzuki, Munehito Kagaya, Hu Li, Masaaki Matsukuma, and Tsuyoshi Moriya (Tokyo Electron Tech. Solutions Ltd., Japan)
Abstract Download
