Date
Place
- Room D (#115)
- TD3. Plasma Sources and Technologies
- July 26 (Thu.)
- 15:30-17:40 ~
- [TD3-5]
- 17:20-17:40 ~
- Title:Study on Uniform Plasma Generation in Electron Cyclotron Resonance Plasma Etching Reactor
- Hitoshi Tamura1, Tsutomu Tetsuka2, Daisuke Kuwahara3, and Shunjiro Shinohara3 (1Hitachi High-Technologies Corporation, Japan, 2Hitachi Ltd., Japan, 3Tokyo Univ. of Agriculture and Tech., Japan)
Abstract Download
