Date
Place
- Room C (#114)
- TC3. Next Generation Plasma Etching
- July 26 (Thu.)
- 15:30-17:00 ~
- [TC3-1]
- 15:30-16:00 ~
- Title:[Invited] Etching of Semiconductor Devices
- Thorsten Lill, Vahid Vahedi, and Richard A. Gottscho (Lam Research Corp., USA)
Abstract Download
