Date
Place
- Room C (#114)
- TC2. Next Generation Plasma Etching
- July 26 (Thu.)
- 13:20-15:00 ~
- [TC2-2]
- 13:50-14:10 ~
- Title:Development of the Virtual Metrology Using a Plasma Information Variable (PI-VM) for Monitoring SiO2 Etch Depth
- Yunchang Jang, Hyun-Joon Roh, Sangwon Ryu, Ji-Won Kwon, and Gon-Ho Kim (Seoul Nat`l Univ., Korea)
Abstract Download
