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Program

Date
Place
  • Room C (#114)
  • TC2. Next Generation Plasma Etching
  • July 26 (Thu.)
  • 13:20-15:00 ~
  • [TC2-1]
  • 13:20-13:50 ~
  • Title:[Invited]  Some Aspects of Process Development in Plasma Etching
  • Nam Hun Kim (Adaptive Plasma Tech. Corp., Korea)

  • Abstract Download