Date
Place
- Room A (#104~106)
- TA1. Sputtering Technologies
- July 26 (Thu.)
- 09:00-10:30 ~
- [TA1-3]
- 10:00-10:30 ~
- Title:[Invited] Effect of Interface on the Structure and Ferro-Electric Property of Y-Doped HfO2 Thin Films Prepared by Reactive Magnetron Co-Sputtering
- Jun Xu1, Yu Zhang1, Da-Yu Zhou1, Wen-Qi Lu1, Hang-Hang Wang1, and Chi Kyu Choi2 (1Dalian Univ. of Tech., China, 2Jeju Nat`l Univ., Korea)
Abstract Download
