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Program

Date
Place
  • Room F (#117~118)
  • FP. Poster Session
  • July 27 (Fri.)
  • 17:30-19:00 ~
  • [FP-100]
  • 17:30-19:00 ~
  • Title:Large-Scale Etching of Silicon Nitride Using a Linear ECR Plasma Source with?Reciprocating Substrate Motion
  • SeongYong Kwon, HoWon Yoon, YunSung Jang, SeungMin Shin, Seungjun Yi, and MunPyo Hong (Korea Univ., Korea)

  • Abstract Download