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Program

Date
Place
  • Room F (#117~118)
  • FP. Poster Session
  • July 27 (Fri.)
  • 17:30-19:00 ~
  • [FP-023]
  • 17:30-19:00 ~
  • Title:The Comparison of End-Point Detection between Optical Spectroscopy and Residual Gas Analysis in Silicon Etching in NF3/Ar Plasma
  • Heetae Kwon, Hwanhee Lee, Giwon Shin, Woojae Kim, and Gichung Kwon (Kwangwoon Univ., Korea)

  • Abstract Download