Date
Place
- Room C (#114)
- FC2. Plasma & Atomic Layer Etching
- July 27 (Fri.)
- 13:40-15:00 ~
- [FC2-3]
- 14:30-15:00 ~
- Title:[Invited] Isotropic Atomic Layer Etching of ZnO on 2D and 3D Substrates Using Acetylacetone and O2 Plasma
- Alfredo Mameli1, Marcel A. Verheijen1, Adrie J.M. Mackus1, Erwin (W.M.M.) Kessels1, and Fred Roozeboom1,2 (1Eindhoven Univ. of Tech., The Netherlands, 2TNO, The Netherlands)
Abstract Download
