Date
Place
- Room C (#114)
- FC2. Plasma & Atomic Layer Etching
- July 27 (Fri.)
- 13:40-15:00 ~
- [FC2-2]
- 14:10-14:30 ~
- Title:Surface Reaction Mechanisms of Hexafluoroacetylacetone (HFAC) on a Nickel or Nickel Oxide Surface for Atomic-Layer Etching (ALE)
- Abdulrahman Hikmat Basher1, Michiro Isobe1, Tomoko Ito1, Kazuhiro Karahashi1, Masato Kiuchi2, Takae Takeuchi3, and Satoshi Hamaguchi1 (1Osaka Univ., Japan, 2AIST, Japan, 3Nara Women`s Univ., Japan)
Abstract Download
