Date
Place
- Room C (#114)
- FC1. Plasma & Atomic Layer Etching
- July 27 (Fri.)
- 09:10-10:40 ~
- [FC1-2]
- 09:50-10:10 ~
- Title:Plasma-Assisted Atomic Layer Etching of Si-Based Dielectric Films Studied Using in Situ Surface Diagnostics
- Sumit Agarwal1, Ryan J. Gasvoda1, Scott Wang2, Ranadeep Bhowmick2, and Eric A. Hudson2 (1Colorado School of Mines, USA, 2Lam Research Corporation, USA.)
Abstract Download
