Date
Place
- Room C (#114)
- FC1. Plasma & Atomic Layer Etching
- July 27 (Fri.)
- 09:10-10:40 ~
- [FC1-1]
- 09:10-09:50 ~
- Title:[Keynote] Challenges to the Next Generation Semiconductor Equipment by Using Plasma
- Kuntack Lee (Samsung Electronics Co., Ltd., Korea)
Abstract Download
