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Program

Date
Place
  • Room F (#117~118)
  • TP. Poster Session
  • July 26 (Thu.)
  • 17:30-19:00 ~
  • [TP-073]
  • 17:30-19:00 ~
  • Title:?Measurements of Plasma Density and Downstream Etching of Silicon and Silicon Oxide in Ar/NF3 Mixture Remote Plasma Source
  • HeeJung Yeom1, YeongSeok Lee2, SiJun Kim2, DaeHan choi1, DaeJin Seong1, JungHyung Kim1, ShinJae You2, and Hyo Chang Lee1 (1KRISS, Korea, 2Chungnam Nat`l Univ., Korea)

  • Abstract Download